Description
Drift Reduction and Deposition Aid/ NIS/ Penetrant
Next Generation Patent Pending Surfactant Emulsion Technology that Improves Uniform Coverage & Consistent Droplet Formation Formulated and Tested for Drones.
- NPE/APE Free formulation allows for flexible application timing without the risk of crop injury.
- Formulated with a unique water-soluble lecithin surfactant that promotes rapid AI permeation without stripping the cuticle wax without adding the risk of additional crop response.
- Patent Pending unique drift reduction system manages droplet formation to reduce drift, increase deposition and coverage within the optimum droplet size range.
- Excellent spreading and wetting characteristics ensure uniform surface coverage and reduced droplet bounce and run-off.
